• DocumentCode
    1518265
  • Title

    Molecular beam epitaxy-grown PbSnTe-PbEuSeTe buried heterostructure diode lasers

  • Author

    Feit, Z. ; Kostyk, D. ; Woods, R.J. ; Mak, Pui-In

  • Author_Institution
    Laser Photonics Anal. Div., Bedford, MA, USA
  • Volume
    2
  • Issue
    12
  • fYear
    1990
  • Firstpage
    860
  • Lastpage
    862
  • Abstract
    Buried heterostructure (BH) PbSnTe-PbEuSeTe lasers with a PbSnTe active layer were fabricated for the first time using a two-stage molecular beam epitaxy (MBE) growth procedure. Lasers with 4- mu m-wide and 0.65- mu m-thick buried Pb/sub 0.961/Sn/sub Sn0.039/Te active layer and Pb/sub 0.985/Eu/sub 0.015/Se/sub 0.02/Te/sub 0.98/ cladding layers were grown. Continuous wave (CW) operating temperature of 175 K was measured with CW threshold currents of 1.6 mA (20 K), 13.6 mA (80 K), and 195 mA (160 K). Single-mode operation with 3.0-cm/sup -1/-mode tuning was measured at 1639.8 cm/sup -1/ emission.<>
  • Keywords
    II-VI semiconductors; europium compounds; laser modes; lead compounds; molecular beam epitaxial growth; optical workshop techniques; semiconductor junction lasers; tin compounds; 0.65 micron; 1.6 mA; 13.6 mA; 175 K; 195 mA; 4 micron; PbSnTe-PbEuSeTe lasers; active layer; buried heterostructure diode lasers; cladding layers; laser CW operating temperature; single node lasing; two-stage molecular beam epitaxy; Atmospheric measurements; Current measurement; Diode lasers; Lattices; Lead; Molecular beam epitaxial growth; Pollution measurement; Spectroscopy; Temperature; Threshold current;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/68.62010
  • Filename
    62010