DocumentCode :
1518848
Title :
Characterisation and modelling of noise parameters of SiC MESFETs
Author :
Eriksson, J. ; Rorsman, N. ; Nilsson, P-Å ; Zirath, H.
Author_Institution :
Dept. of Microwave Electron., Chalmers Univ. of Technol., Goteborg, Sweden
Volume :
35
Issue :
7
fYear :
1999
fDate :
4/1/1999 12:00:00 AM
Firstpage :
574
Lastpage :
575
Abstract :
Noise parameter measurements and a model for 2×100 μm SiC MESFETs fabricated in two different processes are presented. The noise characteristics of SiC MESFETs are well described by a standard noise model. The minimum measured noise figure was 2.0 and 2.7 dB with an associated gain of 7.8 and 12 dB, respectively, at 3 GHz for the two processes
Keywords :
Schottky gate field effect transistors; semiconductor device models; semiconductor device noise; semiconductor materials; silicon compounds; 12 dB; 2.0 dB; 2.7 dB; 3 GHz; 7.8 dB; SiC; SiC MESFET; gain; model; noise figure;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19990426
Filename :
769491
Link To Document :
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