DocumentCode :
1519203
Title :
Prolog to using advanced simulation to aid microlithography development
Author :
Donnell, Richard O´
Volume :
89
Issue :
8
fYear :
2001
Firstpage :
1192
Lastpage :
1193
Keywords :
Circuit simulation; Electron optics; Etching; Lithography; Microelectronics; Optical devices; Optical films; Particle beam optics; Process design; Resists;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/JPROC.2001.940287
Filename :
940287
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1519203
