DocumentCode
1519203
Title
Prolog to using advanced simulation to aid microlithography development
Author
Donnell, Richard O´
Volume
89
Issue
8
fYear
2001
Firstpage
1192
Lastpage
1193
Keywords
Circuit simulation; Electron optics; Etching; Lithography; Microelectronics; Optical devices; Optical films; Particle beam optics; Process design; Resists;
fLanguage
English
Journal_Title
Proceedings of the IEEE
Publisher
ieee
ISSN
0018-9219
Type
jour
DOI
10.1109/JPROC.2001.940287
Filename
940287
Link To Document