DocumentCode :
1519327
Title :
Surface layer impurities on silicon spheres used in determination of the Avogadro constant
Author :
Kenny, Michael J. ; Netterfield, Roger P. ; Wielunski, Leszek S. ; Beaglehole, David
Author_Institution :
CSIRO Telecommun. & Ind. Phys., Lindfield, NSW, Australia
Volume :
48
Issue :
2
fYear :
1999
fDate :
4/1/1999 12:00:00 AM
Firstpage :
233
Lastpage :
237
Abstract :
The Avogadro constant is required to be determined with an uncertainty of less than 1×10-8 in order to allow an atomic definition of the kilogram. A single-crystal silicon sphere 93.6 mm diameter is used for this determination. A thin surface layer (typically 2 nm to 5 nm thick on flats and 10 nm or more on spheres) of contaminants such as oxide, water and hydrocarbons on the sphere can significantly affect the measurements due to corrections for density changes and to phase change on reflection in the diameter measurement by optical interferometry. The stability of this surface layer as a function of time is also of importance because of ongoing measurements. The nature of this contamination has been investigated using optical ellipsometry and ion beam analysis. It is concluded that the composition and structure of the surface layer are affected by a number of parameters and that the most appropriate method of achieving the desired accuracy is to remove the surface layer by etching and to form a hard stable coating of controlled thickness and composition. This coating may be either silicon dioxide or silicon nitride
Keywords :
constants; ellipsometry; etching; impurities; silicon; stability; surface contamination; 93.6 mm; Avogadro constant determination; Si; Si3N4-Si; SiO2-Si; atomic definition; contamination; controlled composition; controlled thickness; diameter measurement; etching; hard stable coating; hydrocarbons; ion beam analysis; kilogram; optical ellipsometry; optical interferometry; oxide layer; silicon spheres; single-crystal Si sphere; surface layer impurities; surface layer removal; surface layer stability; Coatings; Density measurement; Impurities; Optical interferometry; Phase measurement; Pollution measurement; Silicon; Surface contamination; Thickness measurement; Uncertainty;
fLanguage :
English
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9456
Type :
jour
DOI :
10.1109/19.769571
Filename :
769571
Link To Document :
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