DocumentCode :
1519415
Title :
Fabrication of quantum Hall devices for low magnetic fields
Author :
Pierz, Klaus ; Schumacher, Bernd
Author_Institution :
Phys. Tech. Bundesanstalt, Braunschweig, Germany
Volume :
48
Issue :
2
fYear :
1999
fDate :
4/1/1999 12:00:00 AM
Firstpage :
293
Lastpage :
295
Abstract :
The quantized Hall resistance of a two-dimensional electron gas (2DEG) in AlGaAs/GaAs heterostructures is used for the realization of the unit of resistance. This effect is more and more widely used. For possible application even in magnets with magnetic flux densities as low as 6 T, such devices have been produced with carrier concentrations in a range from 2.7×1015 m-2 to 5.4×1015 m-2 and their metrological quality has been checked. We find that even in low magnetic fields the quantized Hall resistance can be reproduced with highest accuracy
Keywords :
III-V semiconductors; aluminium compounds; carrier density; electric resistance measurement; gallium arsenide; quantum Hall effect; semiconductor heterojunctions; two-dimensional electron gas; units (measurement); 6 T; AlGaAs-GaAs; AlGaAs/GaAs heterostructure; carrier concentration; magnetic field; quantized Hall resistance; quantum Hall device; resistance metrology; two-dimensional electron gas; unit; Electrical resistance measurement; Electrons; Fabrication; Gallium arsenide; Geometry; Magnetic field measurement; Magnetic fields; Magnets; Molecular beam epitaxial growth; Substrates;
fLanguage :
English
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9456
Type :
jour
DOI :
10.1109/19.769586
Filename :
769586
Link To Document :
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