Title :
ALD-Assisted Multiorder Dispersion Engineering of Nanophotonic Strip Waveguides
Author :
Erdmanis, Mikhail ; Karvonen, Lasse ; Saleem, Muhammad Rizwan ; Ruoho, Mikko ; Pale, Ville ; Tervonen, Ari ; Honkanen, Seppo ; Tittonen, Ilkka
Author_Institution :
Dept. of Micro- & Nanosci., Aalto Univ., Aalto, Finland
Abstract :
We propose a new technique for the multiorder dispersion engineering of nanophotonic strip waveguides. Unlike other techniques, the method does not require wafers with customized parameters and is fully compatible with standard wafers used in nanophotonics. The dispersion management is based on the application of nanometer-thick TiO2 layer formed by atomic layer deposition. The method is simple and reliable and allows good control of dispersion up to the fourth-order terms. The additional advantages are the reduction of propagation losses and partial compensation of fabrication tolerances.
Keywords :
atomic layer deposition; nanophotonics; optical waveguide components; silicon-on-insulator; titanium compounds; TiO2; atomic layer deposition; dispersion management; fabrication tolerances; multiorder dispersion engineering; nanophotonic strip waveguides; partial compensation; propagation losses; silicon-on-insulator; Coatings; Dispersion; Nonlinear optics; Optical device fabrication; Optical waveguides; Optimized production technology; Silicon; Chromatic dispersion; coatings; optical waveguides; silicon-on-insulator (SOI) technology; thin films;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2012.2200235
