Title :
Compact Model of Drain Current in Short-Channel Triple-Gate FinFETs
Author :
Fasarakis, Nikolaos ; Tsormpatzoglou, Andreas ; Tassis, Dimitrios H. ; Pappas, Ilias ; Papathanasiou, Konstantinos ; Bucher, Matthias ; Ghibaudo, Gerard ; Dimitriadis, Charalabos A.
Author_Institution :
Aristotle Univ. of Thessaloniki, Thessaloniki, Greece
fDate :
7/1/2012 12:00:00 AM
Abstract :
An analytical compact drain current model for undoped (or lightly doped) short-channel triple-gate fin-shaped field-effect transistors (finFETs) is presented, taking into account quantum-mechanical and short-channel effects such as threshold-voltage shifts, drain-induced barrier lowering, and subthreshold slope degradation. In the saturation region, the effects of series resistance, surface roughness scattering, channel length modulation, and saturation velocity were also considered. The proposed model has been validated by comparing the transfer and output characteristics with device simulations and with experimental results. The good accuracy and the symmetry of the model make it suitable for implementation in circuit simulation tools.
Keywords :
MOSFET; circuit simulation; modulation; surface roughness; analytical compact drain current model; channel length modulation; circuit simulation tool; drain-induced barrier lowering; quantum-mechanical effect; saturation velocity; series resistance; short-channel effect; short-channel triple-gate FinFET; short-channel triple-gate fin-shaped field-effect transistors; subthreshold slope degradation; surface roughness scattering; threshold-voltage shift; Analytical models; FinFETs; Logic gates; Mathematical model; Silicon; Threshold voltage; Drain-current modeling; nanoscale finFETs;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2012.2195318