DocumentCode
1519683
Title
Compact Model of Drain Current in Short-Channel Triple-Gate FinFETs
Author
Fasarakis, Nikolaos ; Tsormpatzoglou, Andreas ; Tassis, Dimitrios H. ; Pappas, Ilias ; Papathanasiou, Konstantinos ; Bucher, Matthias ; Ghibaudo, Gerard ; Dimitriadis, Charalabos A.
Author_Institution
Aristotle Univ. of Thessaloniki, Thessaloniki, Greece
Volume
59
Issue
7
fYear
2012
fDate
7/1/2012 12:00:00 AM
Firstpage
1891
Lastpage
1898
Abstract
An analytical compact drain current model for undoped (or lightly doped) short-channel triple-gate fin-shaped field-effect transistors (finFETs) is presented, taking into account quantum-mechanical and short-channel effects such as threshold-voltage shifts, drain-induced barrier lowering, and subthreshold slope degradation. In the saturation region, the effects of series resistance, surface roughness scattering, channel length modulation, and saturation velocity were also considered. The proposed model has been validated by comparing the transfer and output characteristics with device simulations and with experimental results. The good accuracy and the symmetry of the model make it suitable for implementation in circuit simulation tools.
Keywords
MOSFET; circuit simulation; modulation; surface roughness; analytical compact drain current model; channel length modulation; circuit simulation tool; drain-induced barrier lowering; quantum-mechanical effect; saturation velocity; series resistance; short-channel effect; short-channel triple-gate FinFET; short-channel triple-gate fin-shaped field-effect transistors; subthreshold slope degradation; surface roughness scattering; threshold-voltage shift; Analytical models; FinFETs; Logic gates; Mathematical model; Silicon; Threshold voltage; Drain-current modeling; nanoscale finFETs;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2012.2195318
Filename
6202679
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