• DocumentCode
    1520202
  • Title

    Self-defined AlAs oxide-current-aperture buried-heterostructure ridge waveguide InGaAs single-quantum-well diode laser

  • Author

    Won-Jin Choi ; Dapkus, P.D.

  • Author_Institution
    Dept. of Electr. Eng., Univ. of Southern California, Los Angeles, CA, USA
  • Volume
    11
  • Issue
    7
  • fYear
    1999
  • fDate
    7/1/1999 12:00:00 AM
  • Firstpage
    773
  • Lastpage
    775
  • Abstract
    Techniques for fabricating a self-defined AlAs oxide-current-aperture that is applicable to very small stripe width edge emitting devices and small aperture vertical-cavity surface-emitting lasers are reported. InGaAs single-quantum-well buried-heterostructure edge-emitting lasers with a self-defined AlAs oxide-current-aperture were fabricated by a three-step metal-organic chemical vapor deposition growth to demonstrate the validity of the process. The AlAs layer for the AlAs oxide was grown by selective area growth techniques. The threshold current and differential quantum efficiency of 3-μm stripe width, 446-μm-long laser were 2 mA and 91%, respectively. The leakage current at -15 V was less than 20 nA.
  • Keywords
    III-V semiconductors; MOCVD; gallium arsenide; indium compounds; laser beams; laser cavity resonators; optical fabrication; quantum well lasers; ridge waveguides; semiconductor growth; surface emitting lasers; waveguide lasers; -15 V; 2 mA; 20 nA; 3 mum; 446 mum; 91 percent; AlAs; AlAs layer; AlAs oxide; InGaAs; InGaAs single-quantum-well diode laser; buried-heterostructure ridge waveguide laser; differential quantum efficiency; fabrication; leakage current; selective area growth techniques; self-defined AlAs oxide-current-aperture; single-quantum-well buried-heterostructure edge-emitting lasers; stripe width; stripe width edge emitting devices; three-step metal-organic chemical vapor deposition growth; threshold current; vertical-cavity surface-emitting lasers; Apertures; Chemical lasers; Gallium arsenide; Indium gallium arsenide; Optical surface waves; Optical waveguides; Oxidation; Semiconductor lasers; Surface emitting lasers; Vertical cavity surface emitting lasers;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/68.769703
  • Filename
    769703