DocumentCode :
1520555
Title :
Top-Gate Low-Threshold Voltage p\\hbox {-}\\hbox {Cu}_{2} \\hbox {O} Thin-Film Transistor Grown on \\hbo</div>
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            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Author : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>Zou, Xiao ; Fang, Guojia ; Yuan, Longyan ; Li, Meiya ; Guan, Wenjie ; Zhao, Xingzhong</div>
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            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Author_Institution : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>Dept. of Electron. Sci. & Technol., Wuhan Univ., Wuhan, China</div>
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            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Volume : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>31</div>
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            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Issue : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>8</div>
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            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>fYear : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>2010</div>
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            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Firstpage : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>827</div>
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            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Lastpage : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>829</div>
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            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Abstract : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>Copper oxide (Cu<i>x</i>O) thin films were grown on SiO<sub>2</sub>/Si substrate by pulsed laser deposition under different substrate temperatures. Top-gate Cu<i>x</i> O semiconductor thin-film transistors (TFTs) were fabricated with high- κ HfON as gate dielectric. The performance of Cu<sub>2</sub>O TFTs was improved due to increased Hall mobility resulting from the decreased scattering of both the ionized defects and the grain boundary for Cu<sub>2</sub>O channel films. The <i>p</i>-channel pure polycrystalline Cu<sub>2</sub>O TFTs (<i>W</i>/<i>L</i> = 500 μm/20 μm) exhibited a low threshold voltage of -0.8 V, an on-off current ratio of 3 x 10<sup>6</sup>, a saturation mobility of 4.3 cm<sup>2</sup>/ V s, and a subthreshold swing of 0.18 V/decade.</div>
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            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Keywords : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>Hall mobility; copper compounds; hafnium compounds; high-k dielectric thin films; pulsed laser deposition; semiconductor growth; semiconductor thin films; silicon compounds; thin film transistors; Cu<sub>2</sub>O; Hall mobility; HfON; SiO<sub>2</sub>-Si; grain boundary; high-k gate dielectric; pchannel pure polycrystalline TFT; pulsed laser deposition; thin film transistor; top gate low threshold voltage; top gate semiconductor thin film transistors; HfON; polycrystalline <formula formulatype=$hbox{Cu}_{2} hbox{O}$; thin-film transistors (TFTs); threshold voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2010.2050576
Filename :
5491061
Link To Document :
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