DocumentCode :
1520827
Title :
Influence of Plasma Spraying on the Performance of Oxide Cathodes
Author :
Zhang, Min ; Wang, Xiaoxia ; Luo, Jirun ; Zhao, Qinglan ; Liao, Xianheng
Author_Institution :
Inst. of Electron., Chinese Acad. of Sci., Beijing, China
Volume :
58
Issue :
7
fYear :
2011
fDate :
7/1/2011 12:00:00 AM
Firstpage :
2143
Lastpage :
2148
Abstract :
This paper investigates the plasma-spraying technique as applied to oxide cathodes compared with the conventional coating method. In the conventional oxide cathode manufacturing process, a carbonate powder layer BaSrCa(CO3) is either painted or sprayed onto the nickel-base material at room temperature after the carbonate powder has been mixed with a nitrocellulose binder to provide adhesion to the nickel surface. However, the by-products deposited due to the coating of the oxide cathode and the decomposing process, combined with the relatively weak adhesion resulting from this coating method, undermine the performance of the oxide cathode. Plasma spraying can produce a high-quality coating by applying a relatively inert medium using a high-temperature high-particle velocity process. Impacts on the performance of the plasma-sprayed oxide cathode, as compared with a conventionally coated oxide cathode, are presented. The experimental results show that the pulsed-current emission density of a plasma-sprayed oxide cathode is nearly twice that of the conventionally coated oxide cathode, whereas the evaporation rate of the plasma-sprayed oxide cathode is only 10% as much as the conventionally coated oxide cathode.
Keywords :
adhesion; barium compounds; carbon compounds; current density; high-temperature electronics; nickel; oxide coated cathodes; plasma arc sprayed coatings; plasma arc spraying; strontium compounds; by-products; carbonate powder layer; high-temperature high-particle velocity process; nickel-base material; nitrocellulose binder; oxide cathode manufacturing process; plasma sprayed coating; pulsed-current emission density; weak adhesion; Cathodes; Materials; Nickel; Plasmas; Powders; Spraying; Evaporation rate; oxide cathode; plasma spraying; pulsed-current emission density;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2011.2141996
Filename :
5771086
Link To Document :
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