• DocumentCode
    1521298
  • Title

    Macroporous silicon photonic crystals at 1.55 μm

  • Author

    Rowson, S. ; Chelnokov, A. ; Lourtioz, J.M.

  • Author_Institution
    CNRS, Univ. de Paris-Sud, Orsay, France
  • Volume
    35
  • Issue
    9
  • fYear
    1999
  • fDate
    4/29/1999 12:00:00 AM
  • Firstpage
    753
  • Lastpage
    755
  • Abstract
    The limits of macroporous silicon etching are pushed a step further to obtain a complete photonic bandgap centred at 1.55 μm wavelength. A submicrometre period triangular photonic crystal of air holes is etched over a large area of silicon and is characterised by absolute reflection measurements for two propagation directions and both polarisations. The large area covered and the quality of the photonic crystal obtained demonstrate the feasibility of realising high density integrated devices at telecommunication wavelengths
  • Keywords
    elemental semiconductors; etching; integrated optics; optical materials; photonic band gap; porous semiconductors; silicon; 1.55 micron; Si; Si etching; absolute reflection measurements; air holes; high density integrated devices; macroporous Si photonic crystals; photonic bandgap; submicrometre period triangular photonic crystal; telecommunication wavelengths;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19990497
  • Filename
    769871