DocumentCode
1521298
Title
Macroporous silicon photonic crystals at 1.55 μm
Author
Rowson, S. ; Chelnokov, A. ; Lourtioz, J.M.
Author_Institution
CNRS, Univ. de Paris-Sud, Orsay, France
Volume
35
Issue
9
fYear
1999
fDate
4/29/1999 12:00:00 AM
Firstpage
753
Lastpage
755
Abstract
The limits of macroporous silicon etching are pushed a step further to obtain a complete photonic bandgap centred at 1.55 μm wavelength. A submicrometre period triangular photonic crystal of air holes is etched over a large area of silicon and is characterised by absolute reflection measurements for two propagation directions and both polarisations. The large area covered and the quality of the photonic crystal obtained demonstrate the feasibility of realising high density integrated devices at telecommunication wavelengths
Keywords
elemental semiconductors; etching; integrated optics; optical materials; photonic band gap; porous semiconductors; silicon; 1.55 micron; Si; Si etching; absolute reflection measurements; air holes; high density integrated devices; macroporous Si photonic crystals; photonic bandgap; submicrometre period triangular photonic crystal; telecommunication wavelengths;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19990497
Filename
769871
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