DocumentCode :
1521786
Title :
Optimum MOS power matching by exploiting non-quasistatic effect
Author :
Janssens, J. ; Steyaert, M.
Author_Institution :
ESAT, Katholieke Univ., Leuven, Heverlee, Belgium
Volume :
35
Issue :
8
fYear :
1999
fDate :
4/15/1999 12:00:00 AM
Firstpage :
672
Lastpage :
673
Abstract :
Low-noise and power amplifiers commonly use inductive degeneration to match the inherently capacitive MOS device to the source impedance R S. It is shown how this matching technique can be refined by incorporating the non-quasistatic effect and further improved so as to strongly increase the gain. It is shown that the maximum gain is achieved by matching the source impedance RS to the intrinsic gate resistance embodying the non-quasistatic effect
Keywords :
MOSFET; impedance matching; power amplifiers; radiofrequency amplifiers; MOS device; gain; gate resistance; inductive degeneration; low-noise amplifier; nonquasistatic effect; power amplifier; power matching; source impedance;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19990432
Filename :
771026
Link To Document :
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