DocumentCode :
1522722
Title :
Temperature dependence of surface recombination current in MOS transistors
Author :
Wang, Yih ; Neugroschel, Arnost ; Sah, Chih-Tang
Author_Institution :
Dept. of Electr. Eng., Florida Univ., Gainesville, FL, USA
Volume :
48
Issue :
9
fYear :
2001
fDate :
9/1/2001 12:00:00 AM
Firstpage :
2095
Lastpage :
2101
Abstract :
Analytical expressions are derived for the temperature dependence of the peak current amplitude, peak gate voltage, and current-voltage linewidth of the basewell terminal current in metal-oxide-silicon transistors (MOSTs) due to electron-hole recombination at the interface traps. They are verified by experimental data. It is shown that temperature dependence of the basewell terminal current cannot distinguish a discrete energy level from a distribution of energy levels of the interface traps in the silicon energy gap, because the interface traps measured by surface recombination current are those traps with energy close to midgap. A demonstration is given for the accurate determination of the local temperature inside the transistor using the ideal exponential dependence of the collector current on the emitter-base forward-bias voltage
Keywords :
MOSFET; interface states; surface recombination; DC I-V characteristics; MOS transistor; basewell terminal current; current-voltage linewidth; electron-hole recombination; energy level; interface trap; peak current amplitude; peak gate voltage; surface recombination current; temperature dependence; Current measurement; Diodes; Electron traps; Energy states; MOSFETs; Spontaneous emission; Temperature dependence; Temperature sensors; Transistors; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.944201
Filename :
944201
Link To Document :
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