• DocumentCode
    1522722
  • Title

    Temperature dependence of surface recombination current in MOS transistors

  • Author

    Wang, Yih ; Neugroschel, Arnost ; Sah, Chih-Tang

  • Author_Institution
    Dept. of Electr. Eng., Florida Univ., Gainesville, FL, USA
  • Volume
    48
  • Issue
    9
  • fYear
    2001
  • fDate
    9/1/2001 12:00:00 AM
  • Firstpage
    2095
  • Lastpage
    2101
  • Abstract
    Analytical expressions are derived for the temperature dependence of the peak current amplitude, peak gate voltage, and current-voltage linewidth of the basewell terminal current in metal-oxide-silicon transistors (MOSTs) due to electron-hole recombination at the interface traps. They are verified by experimental data. It is shown that temperature dependence of the basewell terminal current cannot distinguish a discrete energy level from a distribution of energy levels of the interface traps in the silicon energy gap, because the interface traps measured by surface recombination current are those traps with energy close to midgap. A demonstration is given for the accurate determination of the local temperature inside the transistor using the ideal exponential dependence of the collector current on the emitter-base forward-bias voltage
  • Keywords
    MOSFET; interface states; surface recombination; DC I-V characteristics; MOS transistor; basewell terminal current; current-voltage linewidth; electron-hole recombination; energy level; interface trap; peak current amplitude; peak gate voltage; surface recombination current; temperature dependence; Current measurement; Diodes; Electron traps; Energy states; MOSFETs; Spontaneous emission; Temperature dependence; Temperature sensors; Transistors; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.944201
  • Filename
    944201