• DocumentCode
    1523215
  • Title

    Physics-Based Compact Model for AlGaN/GaN MODFETs With Close-Formed I V and

  • Author

    Cheng, Xiaoxu ; Li, Miao ; Wang, Yan

  • Author_Institution
    Inst. of Microelectron., Tsinghua Univ., Beijing, China
  • Volume
    56
  • Issue
    12
  • fYear
    2009
  • Firstpage
    2881
  • Lastpage
    2887
  • Abstract
    A set of explicit analytical solutions to the charge concentration, current, and capacitance characteristics of AlGaN/GaN MODFETs in different working regions is developed. First, a unified charge control expression applicable to both subthreshold regions and strong inversion regions is determined, while the parasitic channel effect in AlGaN layer is also taken into account. The onset voltage for this parasitic channel is estimated for the first time. Based on the improved charge control model, the current (I ds), the transconductance (gm), and the output conductance (gd) are given explicitly and are applicable in a wide bias range. Moreover, the gate-to-source capacitance (C gs ) and gate-to-drain capacitance (C gd) have been obtained analytically under various applied biases, and, consequently, the cutoff frequency can be predicted. The present model shows good agreement with the experimental data and is useful for microwave circuit design and analysis.
  • Keywords
    HEMT integrated circuits; III-V semiconductors; aluminium compounds; capacitance; electric admittance; gallium compounds; AlGaN-GaN; C-V characteristics; I-V characteristics; MODFET; charge concentration; charge control expression; current characteristics; gate-to-drain capacitance; gate-to-source capacitance; microwave circuit analysis; microwave circuit design; output conductance; parasitic channel effect; physics-based compact model; transconductance; Aluminum gallium nitride; Capacitance-voltage characteristics; Circuit synthesis; Cutoff frequency; Gallium nitride; HEMTs; MODFETs; Parasitic capacitance; Transconductance; Voltage; AlGaN/GaN MODFET; compact model; cutoff frequency; gate–drain capacitance; gate–source capacitance; sheet charge concentration;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2009.2030722
  • Filename
    5299050