DocumentCode :
1525186
Title :
Interferometry of actuated microcantilevers to determine material properties and test structure nonidealities in MEMS
Author :
Jensen, Brian D. ; de Boer, Maarten P. ; Masters, Nathan D. ; Bitsie, Fernando ; LaVan, David A.
Author_Institution :
Dept. of Mech. Eng., Michigan Univ., Ann Arbor, MI, USA
Volume :
10
Issue :
3
fYear :
2001
fDate :
9/1/2001 12:00:00 AM
Firstpage :
336
Lastpage :
346
Abstract :
By integrating interferometric deflection data from electrostatically actuated microcantilevers with a numerical finite difference model, we have developed a step-by-step procedure to determine values of Young´s modulus while simultaneously quantifying nonidealities. The central concept in the methodology is that nonidealities affect the long-range deflections of the beams, which can be determined to near nanometer accuracy. Beam take-off angle, curvature and support post compliance are systematically determined. Young´s modulus is then the only unknown parameter, and is directly found. We find an average value of Young´s modulus for polycrystalline silicon of 164.3 GPa and a standard deviation of 3.2 GPa (±2%), reflecting data from three different support post designs. Systematic errors were assessed and may alter the average value by ±5%. An independent estimate from grain orientation measurements yielded 163.4-164.4 GPa (the Voigt and Reuss bounds), in agreement with the step-by-step procedure. Other features of the test procedure include that it is rapid, nondestructive, verifiable and requires only a small area on the test chip
Keywords :
Young´s modulus; electrostatic actuators; elemental semiconductors; finite difference methods; light interferometry; semiconductor device testing; silicon; MEMS; Si; Voigt and Reuss bounds; Young´s modulus; beam take-off angle; electrostatically actuated microcantilevers; grain orientation measurements; long-range deflections; numerical finite difference model; polycrystalline silicon; support post designs; test structure nonidealities; Interferometry; Laboratories; Material properties; Materials testing; Mechanical factors; Micromechanical devices; Nondestructive testing; Silicon; Substrates; Transistors;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/84.946779
Filename :
946779
Link To Document :
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