• DocumentCode
    1525186
  • Title

    Interferometry of actuated microcantilevers to determine material properties and test structure nonidealities in MEMS

  • Author

    Jensen, Brian D. ; de Boer, Maarten P. ; Masters, Nathan D. ; Bitsie, Fernando ; LaVan, David A.

  • Author_Institution
    Dept. of Mech. Eng., Michigan Univ., Ann Arbor, MI, USA
  • Volume
    10
  • Issue
    3
  • fYear
    2001
  • fDate
    9/1/2001 12:00:00 AM
  • Firstpage
    336
  • Lastpage
    346
  • Abstract
    By integrating interferometric deflection data from electrostatically actuated microcantilevers with a numerical finite difference model, we have developed a step-by-step procedure to determine values of Young´s modulus while simultaneously quantifying nonidealities. The central concept in the methodology is that nonidealities affect the long-range deflections of the beams, which can be determined to near nanometer accuracy. Beam take-off angle, curvature and support post compliance are systematically determined. Young´s modulus is then the only unknown parameter, and is directly found. We find an average value of Young´s modulus for polycrystalline silicon of 164.3 GPa and a standard deviation of 3.2 GPa (±2%), reflecting data from three different support post designs. Systematic errors were assessed and may alter the average value by ±5%. An independent estimate from grain orientation measurements yielded 163.4-164.4 GPa (the Voigt and Reuss bounds), in agreement with the step-by-step procedure. Other features of the test procedure include that it is rapid, nondestructive, verifiable and requires only a small area on the test chip
  • Keywords
    Young´s modulus; electrostatic actuators; elemental semiconductors; finite difference methods; light interferometry; semiconductor device testing; silicon; MEMS; Si; Voigt and Reuss bounds; Young´s modulus; beam take-off angle; electrostatically actuated microcantilevers; grain orientation measurements; long-range deflections; numerical finite difference model; polycrystalline silicon; support post designs; test structure nonidealities; Interferometry; Laboratories; Material properties; Materials testing; Mechanical factors; Micromechanical devices; Nondestructive testing; Silicon; Substrates; Transistors;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/84.946779
  • Filename
    946779