DocumentCode :
1525564
Title :
Recombination current modeling and carrier lifetime extraction in dual-gate fully-depleted SOI devices
Author :
Ernst, Thomas ; Cristoloveanu, Sorin ; Vandooren, Anne ; Rudenko, Tamara ; Colinge, Jean-Pierre
Author_Institution :
Lab. de Phys. des Composants a Semicond., ENSERG, Grenoble, France
Volume :
46
Issue :
7
fYear :
1999
fDate :
7/1/1999 12:00:00 AM
Firstpage :
1503
Lastpage :
1509
Abstract :
The typical behavior of the recombination current in fully-depleted silicon-on-insulator (SOI) PIN diodes including gate-all-around and double-gate configurations is investigated. An excess forward current is measured when carrier recombination occurs in the whole body of the device. A novel “recombination-box” model is proposed, validated by two-dimensional (2-D) simulation, and used to extract the carrier recombination rate. The physical origin of carrier recombination in fully-depleted structures is discussed in terms of volume and/or surface contributions
Keywords :
MOSFET; carrier lifetime; electron-hole recombination; leakage currents; p-i-n diodes; semiconductor device models; silicon-on-insulator; 2D simulation; PIN diodes; carrier lifetime extraction; carrier recombination rate; double-gate configurations; dual-gate fully-depleted SOI devices; excess forward current; gate-all-around configurations; recombination current modeling; recombination-box model; surface contributions; Bipolar transistors; Charge carrier lifetime; Current measurement; Leakage current; Pulse measurements; Radiative recombination; Semiconductor diodes; Silicon on insulator technology; Spontaneous emission; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.772502
Filename :
772502
Link To Document :
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