DocumentCode
1525584
Title
Experimental and theoretical investigation of nonvolatile memory data-retention
Author
De Salvo, Barbara ; Ghibaudo, Gérard ; Pananakakis, Georges ; Reimbold, Gilles ; Mondond, François ; Guillaumot, Bernard ; Candelier, Philippe
Author_Institution
LPCS/ENSERG, Grenoble, France
Volume
46
Issue
7
fYear
1999
fDate
7/1/1999 12:00:00 AM
Firstpage
1518
Lastpage
1524
Abstract
Data retention is one of the main issues affecting nonvolatile memory reliability due to the critical single-cell internal dimension scaling down. In this paper an extensive investigation of floating-gate memory charge retention is presented. We argue that the retention time, namely log(tR), varies linearly with temperature T rather than with 1/T as commonly assumed, yielding a drastic reduction in the extrapolated time-to-failure. The experimental evidence of the new “T Model” is proved by means of several experimental results. The physical consistency of the “T Model” is shown to reside in the temperature exponential behavior of the Fowler-Nordheim current. Indeed, a good physical modeling of both experimental current-temperature (J-T) and memory retention characteristics is achieved. Finally, it is shown that this new “T Model” reconciles seemingly controversial activation energy data from the literature
Keywords
EPROM; integrated circuit modelling; integrated circuit reliability; integrated memory circuits; leakage currents; life testing; Fowler-Nordheim current; T model; activation energy data; current-temperature characteristics; extrapolated time-to-failure; floating-gate memory charge retention; memory cell retention time; memory reliability; memory retention characteristics; nonvolatile memory data-retention; physical modeling; single-cell internal dimension scaling down; temperature exponential behavior; Acceleration; Dielectric losses; EPROM; Extrapolation; Nonvolatile memory; Reliability theory; Semiconductor device reliability; Semiconductor memory; Temperature distribution; Very large scale integration;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.772505
Filename
772505
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