• DocumentCode
    1525780
  • Title

    Investigation of Metal-Induced Enhancement in Electrical Conductance of Multiwalled Carbon Nanotubes

  • Author

    Kulshrestha, Neha ; Misra, Abhishek ; Bajpai, Reeti ; Roy, Soumyendu ; Misra, D.S.

  • Author_Institution
    Dept. of Phys., Indian Inst. of Technol. Bombay, Mumbai, India
  • Volume
    11
  • Issue
    4
  • fYear
    2012
  • fDate
    7/1/2012 12:00:00 AM
  • Firstpage
    830
  • Lastpage
    835
  • Abstract
    We here segregate the contributions of contact improvement and change in multiwalled carbon nanotube´s (MWNT) inherent properties in electrical conductance enhancement caused by metal deposition. The conductance of individual MWNTs enhances greatly due to the platinum and tungsten deposition even at the locations of the tube where no beneath metal contact is present. The change in conductance is explained in terms of the change in the density of states at Fermi level, due to charge transfer between metal atoms and nanotube as well as by radial stress created on the tube. This type of improved conduction is different from the high bias-assisted tunneling type carrier transport and in our study, even at zero bias an increment of 140% in the typical conductance value has been experimentally observed. These results are important for electronic device perspective of nanowire research, mainly the interconnect applications in real electronic devices.
  • Keywords
    Fermi level; carbon nanotubes; carrier mobility; charge exchange; electrical conductivity; electrical contacts; electronic density of states; interconnections; platinum; tungsten; vapour deposition; C; Fermi level; Pt; W; charge transfer; density-of-states; electrical conductance; electrical conductance enhancement; electronic device perspective; high bias-assisted tunneling type carrier transport; interconnect applications; metal atoms; metal contact; metal deposition; metal-induced enhancement; multiwalled carbon nanotubes; nanowire research; platinum deposition; radial stress; tungsten deposition; zero bias; Contacts; Electrodes; Electron tubes; Platinum; Stress; Tungsten; Current–voltage characteristics; density of states (DOS); electron beam induced deposition; lithography; multiwalled carbon nanotubes (MWNTs);
  • fLanguage
    English
  • Journal_Title
    Nanotechnology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2012.2198239
  • Filename
    6205629