• DocumentCode
    1527538
  • Title

    Power absorption characteristics of an inductively coupled plasma discharge

  • Author

    Yang, J.G. ; Yoon, N.S. ; Kim, B.C. ; Choi, J.H. ; Lee, G.S. ; Hwang, S.M.

  • Author_Institution
    Korea Basis Sci. Inst., Taejeon, South Korea
  • Volume
    27
  • Issue
    3
  • fYear
    1999
  • fDate
    6/1/1999 12:00:00 AM
  • Firstpage
    676
  • Lastpage
    681
  • Abstract
    Power absorption characteristics of an inductively coupled discharge are investigated experimentally and compared with a two-dimensional inductive heating theory in a planar single turn antenna at high frequency (18 MHz) and low pressure (⩽50 mtorr) conditions. We measure the resistance R, which consists of vacuum resistance Rν and the plasma resistance Rp for a given RF power of P=½Ic2R, where Ic is the coil current. The vacuum resistance is determined to be 0.44 R in our case. The plasma resistance increases as the gas pressure increases in a pressure range of 2 to 50 mtorr. Also, it increases with power. In a high-pressure range near 50 mtorr, however, it has a nearly constant value of about 0.6 Ω
  • Keywords
    discharges (electric); inductance; plasma heating; plasma pressure; plasma transport processes; RF power; coil current; high-pressure range; inductively coupled plasma discharge; planar single turn antenna; plasma resistance; power absorption characteristics; two-dimensional inductive heating theory; vacuum resistance; Absorption; Antenna measurements; Antenna theory; Current measurement; Electrical resistance measurement; Frequency; Heating; Plasma measurements; Plasma properties; Power measurement;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.774671
  • Filename
    774671