Title :
Macroparticle reflection from a biased substrate in a vacuum arc deposition system
Author :
Keidar, M. ; Beilis, I.I.
Author_Institution :
Lawrence Berkeley Lab., CA, USA
fDate :
6/1/1999 12:00:00 AM
Abstract :
The reflection of macroparticles, generated by a vacuum arc, from a substrate biased negatively with respect to the surrounding plasma is considered. Charging of macroparticle in the near-substrate sheath and its influence on the macroparticle motion were taken into account. It was found that macroparticles can be either reflected or attracted to the substrate depending strongly on the ion current density. The possibility of macroparticle reflection increases with negative bias voltage and saturates at about a few hundred volts
Keywords :
current density; plasma density; plasma deposition; plasma jets; plasma sheaths; reflection; vacuum arcs; ion current density; macroparticle generation; macroparticle motion; macroparticle reflection; metal plasma jets; near-substrate sheath; negative bias voltage; negatively biased substrate; surrounding plasma; vacuum arc deposition system; Plasma applications; Plasma density; Plasma devices; Plasma measurements; Plasma properties; Plasma sheaths; Plasma transport processes; Reflection; Vacuum arcs; Vacuum systems;
Journal_Title :
Plasma Science, IEEE Transactions on
