• DocumentCode
    1528020
  • Title

    Transistor action in GaP/TmP/GaAs heterostructure

  • Author

    Lin, Ching-Hsi ; Hwu, R.J. ; Sadwick, L.P.

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Utah Univ., Salt Lake City, UT, USA
  • Volume
    37
  • Issue
    18
  • fYear
    2001
  • fDate
    8/30/2001 12:00:00 AM
  • Firstpage
    1142
  • Lastpage
    1143
  • Abstract
    Transistor action in a gallium phosphide/thulium phosphide/gallium arsenide (GaP/TmP/GaAs) structure with a GaP emitter, TmP base, and GaAs collector is reported. The emitter-base junction was constructed through wafer bonding and the base-collector junction was formed by epitaxial growth of TmP on GaAs in a molecular beam epitaxy system. From the I-V measurements, a common base current gain α≃0.55 measured at V CB=0 was obtained at room temperature
  • Keywords
    III-V semiconductors; bipolar transistors; gallium arsenide; gallium compounds; molecular beam epitaxial growth; semiconductor heterojunctions; thulium compounds; wafer bonding; GaAs collector; GaP emitter; GaP-TmP-GaAs; GaP/TmP/GaAs heterostructure; I-V measurements; TmP base; base-collector junction; common base current gain; emitter-base junction; epitaxial growth; molecular beam epitaxy system; room temperature; transistor action; wafer bonding;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20010771
  • Filename
    948959