DocumentCode
1528757
Title
Dust charge in the sheath of collisional low-pressure capacitive RF discharges
Author
Chen, Xiaoping
Author_Institution
Southwestern Inst. of Phys., Chengdu, China
Volume
25
Issue
5
fYear
1997
fDate
10/1/1997 12:00:00 AM
Firstpage
1117
Lastpage
1123
Abstract
Dust particles acquire electric charges by collecting electron and ion currents in plasma. These charged particles will be trapped in the sheath under some conditions. We consider the dust charge in the situation of a “plasma crystal”, in which the dust particles are suspended in the collisional capacitive RF sheath at an equilibrium position. We use a cutoff like the two-temperature Maxwellian distribution to model the non-Maxwellian electron energy distribution function (EEDF) in capacitive RF discharges, and a δ function to describe the density of dust particles; the equilibrium parameters are obtained analytically for a collisional sheath. It is found that the dust charge is very sensitive to the particle´s radius, electron temperature, and ion initial velocity. The relationship between dust charge and electron temperature and the particle´s radius in the sheath region is opposite to that in the plasma region
Keywords
dust; electric charge; high-frequency discharges; plasma collision processes; plasma density; plasma impurities; plasma sheaths; plasma temperature; plasma theory; δ function; capacitive RF discharges; collisional capacitive RF sheath; collisional low-pressure capacitive RF discharges; collisional sheath; density; dust charge; dust particles; electric charges; electron currents; electron temperature; equilibrium parameters; equilibrium position; ion currents; ion initial velocity; nonMaxwellian electron energy distribution function; particle radius; plasma crystal; plasma region; sheath region; two-temperature Maxwellian distribution; Crystallization; Dusty plasma; Electron emission; Electron traps; Plasma materials processing; Plasma sheaths; Plasma temperature; Radio frequency; Steady-state; Temperature sensors;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.649633
Filename
649633
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