• DocumentCode
    1528757
  • Title

    Dust charge in the sheath of collisional low-pressure capacitive RF discharges

  • Author

    Chen, Xiaoping

  • Author_Institution
    Southwestern Inst. of Phys., Chengdu, China
  • Volume
    25
  • Issue
    5
  • fYear
    1997
  • fDate
    10/1/1997 12:00:00 AM
  • Firstpage
    1117
  • Lastpage
    1123
  • Abstract
    Dust particles acquire electric charges by collecting electron and ion currents in plasma. These charged particles will be trapped in the sheath under some conditions. We consider the dust charge in the situation of a “plasma crystal”, in which the dust particles are suspended in the collisional capacitive RF sheath at an equilibrium position. We use a cutoff like the two-temperature Maxwellian distribution to model the non-Maxwellian electron energy distribution function (EEDF) in capacitive RF discharges, and a δ function to describe the density of dust particles; the equilibrium parameters are obtained analytically for a collisional sheath. It is found that the dust charge is very sensitive to the particle´s radius, electron temperature, and ion initial velocity. The relationship between dust charge and electron temperature and the particle´s radius in the sheath region is opposite to that in the plasma region
  • Keywords
    dust; electric charge; high-frequency discharges; plasma collision processes; plasma density; plasma impurities; plasma sheaths; plasma temperature; plasma theory; δ function; capacitive RF discharges; collisional capacitive RF sheath; collisional low-pressure capacitive RF discharges; collisional sheath; density; dust charge; dust particles; electric charges; electron currents; electron temperature; equilibrium parameters; equilibrium position; ion currents; ion initial velocity; nonMaxwellian electron energy distribution function; particle radius; plasma crystal; plasma region; sheath region; two-temperature Maxwellian distribution; Crystallization; Dusty plasma; Electron emission; Electron traps; Plasma materials processing; Plasma sheaths; Plasma temperature; Radio frequency; Steady-state; Temperature sensors;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.649633
  • Filename
    649633