Deoxygenation of Y-Ba-Cu-O thin films by reactive ion implantation

Author

Wong, A. ; Kulpa, A. ; Ruixing Liang ; Dosanjh, P. ; Carolan, J.F. ; Hardy, W.N. ; Kato, H. ; Jaeger, N.A.F. ; Ma, Q.Y.

Author_Institution

Dept. of Phys., British Columbia Univ., Vancouver, BC, Canada

Volume

7

Issue

2

fYear

1997

fDate

6/1/1997 12:00:00 AM

Firstpage

2134

Lastpage

2137

Abstract

Thin films of YBa/sub 2/Cu/sub 3/O/sub 7/ (YBCO), grown by pulsed laser deposition, were implanted with Si/sup +/ ions at energies of 30,60, and 90 keV and at doses ranging from 1/spl times/10/sup 13/ cm/sup -2/ to 3/spl times/10/sup 11/ cm/sup -2/. X-ray diffraction techniques were used to investigate the structural dependence on implant parameters and annealing conditions, while d.c. magnetization was measured to characterize superconducting properties. By implanting only the upper portion of the film, implanted Si/sup +/ ions, near the surface, inhibit the superconductivity by removing oxygen from the bottom YBCO lattice which still retains its original crystal structure.

Keywords

X-ray diffraction; annealing; barium compounds; crystal structure; high-temperature superconductors; ion implantation; magnetisation; pulsed laser deposition; silicon; superconducting thin films; yttrium compounds; 30 to 90 keV; X-ray diffraction; YBa/sub 2/Cu/sub 3/O/sub 7/:Si; annealing conditions; crystal structure; magnetization; pulsed laser deposition; reactive ion implantation; structural dependence; superconducting properties; thin films; Ion implantation; Optical pulses; Pulsed laser deposition; Semiconductor thin films; Sputtering; Superconducting films; Transistors; X-ray diffraction; X-ray lasers; Yttrium barium copper oxide;

fLanguage

English

Journal_Title

Applied Superconductivity, IEEE Transactions on

Publisher

ieee

ISSN

1051-8223

Type

jour

DOI

10.1109/77.621014

Filename

621014