DocumentCode :
1529788
Title :
High Gain and Fast Detection of Warfare Agents Using Back-Gated Silicon-Nanowired MOSFETs
Author :
Passi, Vikram ; Ravaux, Florent ; Dubois, Emmanuel ; Clavaguera, Simon ; Carella, Alexandre ; Celle, Caroline ; Simonato, Jean-Pierre ; Silvestri, Luca ; Reggiani, Susanna ; Vuillaume, Dominique ; Raskin, Jean-Pierre
Author_Institution :
Inst. of Inf. & Commun. Technol., Electron. & Appl. Math., Catholic Univ. of Louvain, Louvain-la-Neuve, Belgium
Volume :
32
Issue :
7
fYear :
2011
fDate :
7/1/2011 12:00:00 AM
Firstpage :
976
Lastpage :
978
Abstract :
The top-down fabrication of doped p-type silicon-nanowired (NW) arrays and their application as gas detectors is presented. After surface functionalization with 3-(4-ethynylbenzyl)-1, 5, 7-trimethyl-3-azabicyclo [3.3.1] nonane-7-methanol molecules, the wires were subjected to an organophosphorous simulant, and both static and dynamic measurements were performed. A current gain of 4 × 106 is obtained upon the detection of the subpart-per-million concentration of a nerve-agent simulant. This represents a four-decade improvement over previous demonstration based on nanoribbons, proving better sensing capabilities of NWs. Technology-computer-aided-design simulations before and after gas detection have been performed to gain insight into the physical mechanisms involved in the gas detection and to investigate the impact of the surface-to-volume ratio on sensor sensitivity.
Keywords :
MOSFET; elemental semiconductors; gas sensors; nanowires; silicon; technology CAD (electronics); Si; back-gated silicon-nanowired MOSFET; gas detectors; nanoribbons; nerve-agent simulant; organophosphorous simulant; sensor sensitivity; surface functionalization; surface-to-volume ratio; technology-computer-aided-design; warfare agents; Current measurement; Nanobioscience; Nanowires; Sensitivity; Silicon; Substrates; Surface treatment; Gas detection; metal–oxide–semiconductor field-effect transistors (MOSFETs); silicon nanowires (NWs); silicon surface functionalization;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2011.2146750
Filename :
5779694
Link To Document :
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