Improvement of magnetic and R/W properties in longitudinal media by using CrX/Cr dual underlayer

Author

Djayaprawira, D.D. ; Horii, A. ; Komiyama, K. ; Yoshimura, S. ; Mikami, M. ; Domon, H. ; Takahashi, M.

Author_Institution

Dept. of Electron. Eng., Tohoku Univ., Sendai, Japan

Volume

37

Issue

4

fYear

2001

fDate

7/1/2001 12:00:00 AM

Firstpage

1497

Lastpage

1499

Abstract

The effect of in-plane lattice matching on the magnetic and read/write properties has been quantitatively studied in CoCr₂₄Pt₁₂B₄ or CoCr₂₀Pt₈Ta ₄ media grown on Cr, CrMo₂₀ and CrMo₂₀/Cr underlayer. It is found that by using CrMo₂₀ (5 nm)/Cr (5 nm) dual underlayer, significant improvement of magnetic and R/W properties are realized. It is clarified that: (1) the utilization of CrMo/Cr dual underlayer increases H_c mainly due to the improvement of in-plane crystallographic orientation; (2) the lattice misfit has a small effect on the improvement of in-plane crystallographic orientation. The improvement of in-plane crystallographic orientation by using CrX/Cr dual underlayer is suggested to be due to lattice strain at the interface of Cr and CrX underlayer, which enhances the grain growth of the magnetic layer

Keywords

X-ray diffraction; chromium alloys; cobalt alloys; ferromagnetic materials; grain growth; lattice constants; magnetic anisotropy; magnetic thin films; platinum alloys; sputter deposition; 5 nm; CoCr₂₀Pt₈Ta₄; CoCr₂₄Pt₁₂B₄; CrMo₂₀-Cr; grain growth; in-plane crystallographic orientation; in-plane lattice matching; lattice misfit; lattice strain; longitudinal media; read/write properties; Chromium alloys; Crystallography; Design optimization; Lattices; Magnetic anisotropy; Magnetic properties; Perpendicular magnetic anisotropy; Sputtering; Substrates; X-ray scattering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.950882

Filename

950882