• DocumentCode
    1530108
  • Title

    A study on VMn underlayer in CoCrPt longitudinal media

  • Author

    Oh, Se Chung ; Lee, Taek Dong

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Korea Adv. Inst. of Sci. & Technol., Taejon, South Korea
  • Volume
    37
  • Issue
    4
  • fYear
    2001
  • fDate
    7/1/2001 12:00:00 AM
  • Firstpage
    1504
  • Lastpage
    1507
  • Abstract
    The effects of a novel VMn underlayer on magnetic properties of a CoCrPt/VMn longitudinal medium were studied and compared with those of a CoCrPt/Cr medium. It was found that the VMn film had (200) preferred orientation and the lattice constant was about 0.2967 nm, which is slightly larger than that of the Cr, 0.2888 nm. The grain size of the VMn film was 9.8 nm at 30 nm thickness and this is about 39% smaller than that of a similarly deposited Cr film. The CoCrP/VMn films showed higher coercivity in comparison with the CoCrPt/Cr films. V and Mn have diffused into the CoCrPt magnetic layer more uniformly rather than preferentially along grain boundaries and this reduced Ms at higher substrate temperature. However, due to the grain substrate of the CoCrPt on the VMn underlayer, we have introduced a CrMo intermediate layer and its magnetic properties are described
  • Keywords
    X-ray chemical analysis; X-ray diffraction; chromium alloys; cobalt alloys; coercive force; diffusion; grain boundaries; grain size; interface magnetism; magnetic recording; magnetic thin films; manganese alloys; platinum alloys; sputtered coatings; texture; transmission electron microscopy; vanadium alloys; CoCrPt-CrMo-VMn; CoCrPt-VMn; EDX; TEM; XRD; grain size; intermediate layer; lattice constant; longitudinal recording media; magnetic properties; preferred orientation; sputtered films; underlayer effect; Chromium; Coercive force; Grain size; Lattices; Magnetic films; Magnetic noise; Magnetic properties; Magnetic recording; Substrates; Temperature;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.950884
  • Filename
    950884