DocumentCode :
1530179
Title :
Max Separation Clustering for Feature Extraction From Optical Emission Spectroscopy Data
Author :
Flynn, Beibei ; McLoone, Seán
Author_Institution :
Dept. of Electron. Eng., Nat. Univ. of Ireland, Maynooth, Ireland
Volume :
24
Issue :
4
fYear :
2011
Firstpage :
480
Lastpage :
488
Abstract :
This paper proposes max separation clustering (MSC), a new non-hierarchical clustering method used for feature extraction from optical emission spectroscopy (OES) data for plasma etch process control applications. OES data is high dimensional and inherently highly redundant with the result that it is difficult if not impossible to recognize useful features and key variables by direct visualization. MSC is developed for clustering variables with distinctive patterns and providing effective pattern representation by a small number of representative variables. The relationship between signal-to-noise ratio (SNR) and clustering performance is highlighted, leading to a requirement that low SNR signals be removed before applying MSC. Experimental results on industrial OES data show that MSC with low SNR signal removal produces effective summarization of the dominant patterns in the data.
Keywords :
feature extraction; pattern clustering; process control; sputter etching; visible spectroscopy; MSC; OES data; SNR signal removal; feature extraction; max separation clustering; nonhierarchical clustering method; optical emission spectroscopy data; plasma etch process control applications; signal-to-noise ratio; Clustering algorithms; Dry etching; Feature extraction; Metrology; Plasma diagnostics; Plasma measurement; Plasmas; Separation processes; Feature extraction; max separation clustering; non-hierarchical clustering; optical emission spectroscopy; plasma etch; semiconductor manufacturing;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/TSM.2011.2158122
Filename :
5779753
Link To Document :
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