DocumentCode :
1530506
Title :
Resistivity dependence of gauge factor of polysilicon strain gauge
Author :
Kim, Youngjae ; Kwon, Susanna
Author_Institution :
Dept. of Aerosp. Eng., KAIST, Daejeon, South Korea
Volume :
5
Issue :
3
fYear :
2010
fDate :
6/1/2010 12:00:00 AM
Firstpage :
189
Lastpage :
192
Abstract :
A method to estimate the gauge factor of a polysilicon strain gauge at the wafer level is proposed. It is difficult to measure the gauge factor of a polysilicon strain gauge formed on the silicon diaphragm of a mechanical transducer because the polysilicon strain gauge is integrated into the diaphragm. The authors fabricated polysilicon strain gauges of various shapes and implanted with various concentrations of boron, and measured the gauge factor of each strain gauge. In the experimental results, the gauge factors are calculated by multiplying the resistivity coefficient of gauge factor (RCGF) determined by the boron concentration and resistivity of the polysilicon strain gauge. The authors also determined the RCGF of the polysilicon strain gauges implanted with boron concentrations of 1.0×1019, 1.5×1019 and 1.0×1020 cm-3.
Keywords :
boron; electrical resistivity; elemental semiconductors; ion implantation; micromechanical devices; silicon; strain gauges; transducers; Si:B; boron concentrations; mechanical transducer; polysilicon strain gauge; resistivity coefficient of gauge factor; resistivity dependence; silicon diaphragm;
fLanguage :
English
Journal_Title :
Micro & Nano Letters, IET
Publisher :
iet
ISSN :
1750-0443
Type :
jour
DOI :
10.1049/mnl.2010.0031
Filename :
5504878
Link To Document :
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