• DocumentCode
    1530506
  • Title

    Resistivity dependence of gauge factor of polysilicon strain gauge

  • Author

    Kim, Youngjae ; Kwon, Susanna

  • Author_Institution
    Dept. of Aerosp. Eng., KAIST, Daejeon, South Korea
  • Volume
    5
  • Issue
    3
  • fYear
    2010
  • fDate
    6/1/2010 12:00:00 AM
  • Firstpage
    189
  • Lastpage
    192
  • Abstract
    A method to estimate the gauge factor of a polysilicon strain gauge at the wafer level is proposed. It is difficult to measure the gauge factor of a polysilicon strain gauge formed on the silicon diaphragm of a mechanical transducer because the polysilicon strain gauge is integrated into the diaphragm. The authors fabricated polysilicon strain gauges of various shapes and implanted with various concentrations of boron, and measured the gauge factor of each strain gauge. In the experimental results, the gauge factors are calculated by multiplying the resistivity coefficient of gauge factor (RCGF) determined by the boron concentration and resistivity of the polysilicon strain gauge. The authors also determined the RCGF of the polysilicon strain gauges implanted with boron concentrations of 1.0×1019, 1.5×1019 and 1.0×1020 cm-3.
  • Keywords
    boron; electrical resistivity; elemental semiconductors; ion implantation; micromechanical devices; silicon; strain gauges; transducers; Si:B; boron concentrations; mechanical transducer; polysilicon strain gauge; resistivity coefficient of gauge factor; resistivity dependence; silicon diaphragm;
  • fLanguage
    English
  • Journal_Title
    Micro & Nano Letters, IET
  • Publisher
    iet
  • ISSN
    1750-0443
  • Type

    jour

  • DOI
    10.1049/mnl.2010.0031
  • Filename
    5504878