DocumentCode :
1530896
Title :
Properties of heavily irradiated mosfets
Author :
Gaw, Eng Tsan ; Oldham, W.G.
Author_Institution :
Department of Electrical Engineering and Computer Sciences and the Electronics Research Laboratory University of California, Berkeley, California 94720
Volume :
21
Issue :
6
fYear :
1974
Firstpage :
124
Lastpage :
129
Abstract :
Studies of channel mobility reduction in P channel MOSFETS with gamma and/or neutron irradiation are reported. For pure gamma irradiation, the reduction in mobility is caused by increased surface charge scattering. The surface charge scattering mobility is found to have a temperature and surface charge dependence of T−0.5/NSC. For pure neutron irradiation, the reduction in channel mobility arises from scattering at neutron-produced bulk-centers. In reactor neutron irradiations, gamma fluence can be as important as the neutron fluence in reducing channel mobility.
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1974.6498916
Filename :
6498916
Link To Document :
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