Title :
Radiation hardening of CMOS/SOS integrated circuits
Author_Institution :
RCA Laboratories Princeton, New Jersey
Abstract :
Radiation tolerant CMOS circuits can be made by building them in a thin film of silicon-on-sapphire (SOS) with a hard gate dielectric. Radiation effects in MOS devices are reviewed, and the problems associated with radiation tolerant CMOS/SOS devices are described. Some gate dielectric techniques which show promise in hardening CMOS circuits are presented, and the radiation behavior of Al2O3 gate dielectrics are described.
Journal_Title :
Nuclear Science, IEEE Transactions on
DOI :
10.1109/TNS.1974.6498921