DocumentCode
1530927
Title
Radiation hardening of CMOS/SOS integrated circuits
Author
Schlesier, K.M.
Author_Institution
RCA Laboratories Princeton, New Jersey
Volume
21
Issue
6
fYear
1974
Firstpage
152
Lastpage
158
Abstract
Radiation tolerant CMOS circuits can be made by building them in a thin film of silicon-on-sapphire (SOS) with a hard gate dielectric. Radiation effects in MOS devices are reviewed, and the problems associated with radiation tolerant CMOS/SOS devices are described. Some gate dielectric techniques which show promise in hardening CMOS circuits are presented, and the radiation behavior of Al2 O3 gate dielectrics are described.
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1974.6498921
Filename
6498921
Link To Document