Facile approach to ZnO nanorods by directly etching zinc substrate

The growth of ZnO nanorods by directly etching Zn foil through a low-temperature aqueous method has been demonstrated. The as-obtained ZnO nanorod possesses a single crystalline structure. The morphologies of ZnO nanostructures are sensitive to a series of growth parameters. Room-temperature photoluminescence property of the as-synthesised ZnO nanorods shows a strong ultraviolet emission peak at 379 nm. The present work demonstrates the feasibility of the growth of semiconductor nanorods by directly etching the substrate.