Title :
High resolution X-ray imaging using amorphous silicon flat-panel arrays
Author :
Rahn, J.T. ; Lemmi, F. ; Lu, J.P. ; Mei, P. ; Apte, R.B. ; Street, R.A. ; Lujan, R. ; Weisfield, R.L. ; Heanue, J.A.
Author_Institution :
Xerox Palo Alto Res. Center, CA, USA
fDate :
6/1/1999 12:00:00 AM
Abstract :
Two dimensional amorphous silicon arrays are the emerging technology for digital medical X-ray imaging. This paper demonstrates an improved pixel design compared with the current generation of imagers. The geometry of the pixel sensor has been extended from a mesa isolated structure into a continuous layer above the readout structures of the array. This approach improves sensitivity to visible light, and to X-ray illumination when coupled with a conversion phosphor. Furthermore, this 3-dimensional geometry allows for the fabrication of the finest pitch amorphous silicon array yet manufactured, with a pixel size of 64 μm square. A test array (512×640 pixels) has been fabricated and tested which demonstrates the success of this approach
Keywords :
X-ray detection; amorphous semiconductors; biomedical equipment; diagnostic radiography; elemental semiconductors; image intensifiers; image sensors; silicon radiation detectors; 2D arrays; 3-dimensional geometry; 512 pixel; 640 pixel; Si; active matrix flat panel imagers; amorphous silicon flat-panel arrays; continuous layer; conversion phosphor; digital medical X-ray imaging; full fill factor approach; high resolution X-ray imaging; improved pixel design; improved sensitivity; mesa isolated structure; pixel sensor; Amorphous silicon; Biomedical imaging; Geometry; Image generation; Image resolution; Isolation technology; Pixel; Sensor arrays; Testing; X-ray imaging;
Journal_Title :
Nuclear Science, IEEE Transactions on
