• DocumentCode
    1531575
  • Title

    Magnetic combinatorial thin-film libraries

  • Author

    Russek, Stephen E. ; Bailey, William E. ; Alers, George ; Abraham, Dan L.

  • Author_Institution
    Nat. Inst. of Stand. & Technol., Boulder, CO, USA
  • Volume
    37
  • Issue
    4
  • fYear
    2001
  • fDate
    7/1/2001 12:00:00 AM
  • Firstpage
    2156
  • Lastpage
    2158
  • Abstract
    Magnetic combinatorial libraries have been fabricated to investigate complex magnetic thin-film systems and to provide test samples for the development of on-wafer metrologies. The use of combinatorial material techniques is a new and powerful method to develop and investigate magnetic thin-film systems that require ternary or quaternary alloys. Libraries were fabricated by co-depositing Ni0.8Fe0.2, Co, and Tb in a configuration designed to provide compositional gradients across the wafer. The initial libraries consist of 20×20 sites, each marked with an identification number. The composition varies across the wafer, with compositions of Tb0.60(NiFe)0.10Co0.30, Tb0.22(NiFe)0.22Co0.56, Tb0.10 (NiFe)0.65Co0.25 at the Tb, Co, NiFe rich corners respectively. The purpose of this particular library was to investigate optimal magnetostrictive thin films that have large magnetostriction yet relatively small saturation fields, and to look for compositions that have large magneto-optical effects
  • Keywords
    cobalt alloys; ferromagnetic materials; iron alloys; magnetic thin films; magneto-optical effects; magnetostriction; nickel alloys; terbium alloys; TbNiFeCo; compositional gradients; magnetic combinatorial thin-film libraries; magneto-optical effects; magnetostrictive thin films; on-wafer metrologies; saturation fields; Iron; Libraries; Magnetic films; Magnetic materials; Magnetooptic effects; Magnetostriction; Metrology; Saturation magnetization; System testing; Transistors;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.951110
  • Filename
    951110