• DocumentCode
    1532150
  • Title

    New growth method of solid phase epitaxy in sputtered YIG films

  • Author

    Jang, Pyung Woo ; Kim, Ji Young

  • Author_Institution
    Dept. of Phys., Chongju Univ., Cheongju, South Korea
  • Volume
    37
  • Issue
    4
  • fYear
    2001
  • fDate
    7/1/2001 12:00:00 AM
  • Firstpage
    2438
  • Lastpage
    2440
  • Abstract
    A new method of growing YIG films by solid phase epitaxy was attempted, for which amorphous Y-Fe-O films were sputtered on GGG (111) substrates at room temperature with a high sputtering rate, and subsequently annealed in various atmosphere at a temperature higher than 650°C. A possibility for SPE in YIG film could be verified by a constant growth rate of YIG films during the annealing as well as by results of both θ-2θ scanning and a very low value of Δθ50 in rocking curves
  • Keywords
    X-ray diffraction; annealing; garnets; magnetic epitaxial layers; solid phase epitaxial growth; sputtered coatings; yttrium compounds; 650 C; GGG(111) substrate; X-ray diffraction; Y-Fe-O amorphous film; YFe5O12; YIG; YIG sputtered film; annealing; growth method; solid phase epitaxy; Amorphous materials; Annealing; Epitaxial growth; Iron; Magnetic films; Optical films; Solids; Sputtering; Substrates; Temperature;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.951196
  • Filename
    951196
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1532150