• DocumentCode
    1532469
  • Title

    Dependence of ionizing radiation induced hFE degradation on emitter periphery

  • Author

    Pease, R.L. ; Coppage, F.N. ; Graham, E.D.

  • Author_Institution
    Naval Ammunition Depot, Crane, IN, USA
  • Volume
    21
  • Issue
    2
  • fYear
    1974
  • fDate
    4/1/1974 12:00:00 AM
  • Firstpage
    41
  • Lastpage
    42
  • Abstract
    Devices which differ only iin emitter periphery were subjected to ionizing radiation to investigate the influence of emitter periphery on hFE degradation. The data indicate that, within reasonable limits, the increase in base current from ionizing radiation is directly proportional to the length of the emitter periphery. However, differences in fabrication techniques, passivation materials and processing, and silicon crystal orientation may very well have a greater influence on the degradation from ionizing radiation than the emitter periphery.
  • Keywords
    bipolar transistors; radiation effects; base current; degradation; emitter periphery; fabrication techniques; ionizing radiation; passivation materials;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1974.6499150
  • Filename
    6499150