DocumentCode :
1532469
Title :
Dependence of ionizing radiation induced hFE degradation on emitter periphery
Author :
Pease, R.L. ; Coppage, F.N. ; Graham, E.D.
Author_Institution :
Naval Ammunition Depot, Crane, IN, USA
Volume :
21
Issue :
2
fYear :
1974
fDate :
4/1/1974 12:00:00 AM
Firstpage :
41
Lastpage :
42
Abstract :
Devices which differ only iin emitter periphery were subjected to ionizing radiation to investigate the influence of emitter periphery on hFE degradation. The data indicate that, within reasonable limits, the increase in base current from ionizing radiation is directly proportional to the length of the emitter periphery. However, differences in fabrication techniques, passivation materials and processing, and silicon crystal orientation may very well have a greater influence on the degradation from ionizing radiation than the emitter periphery.
Keywords :
bipolar transistors; radiation effects; base current; degradation; emitter periphery; fabrication techniques; ionizing radiation; passivation materials;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1974.6499150
Filename :
6499150
Link To Document :
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