Title :
Dependence of ionizing radiation induced hFE degradation on emitter periphery
Author :
Pease, R.L. ; Coppage, F.N. ; Graham, E.D.
Author_Institution :
Naval Ammunition Depot, Crane, IN, USA
fDate :
4/1/1974 12:00:00 AM
Abstract :
Devices which differ only iin emitter periphery were subjected to ionizing radiation to investigate the influence of emitter periphery on hFE degradation. The data indicate that, within reasonable limits, the increase in base current from ionizing radiation is directly proportional to the length of the emitter periphery. However, differences in fabrication techniques, passivation materials and processing, and silicon crystal orientation may very well have a greater influence on the degradation from ionizing radiation than the emitter periphery.
Keywords :
bipolar transistors; radiation effects; base current; degradation; emitter periphery; fabrication techniques; ionizing radiation; passivation materials;
Journal_Title :
Nuclear Science, IEEE Transactions on
DOI :
10.1109/TNS.1974.6499150