DocumentCode
1532469
Title
Dependence of ionizing radiation induced hFE degradation on emitter periphery
Author
Pease, R.L. ; Coppage, F.N. ; Graham, E.D.
Author_Institution
Naval Ammunition Depot, Crane, IN, USA
Volume
21
Issue
2
fYear
1974
fDate
4/1/1974 12:00:00 AM
Firstpage
41
Lastpage
42
Abstract
Devices which differ only iin emitter periphery were subjected to ionizing radiation to investigate the influence of emitter periphery on hFE degradation. The data indicate that, within reasonable limits, the increase in base current from ionizing radiation is directly proportional to the length of the emitter periphery. However, differences in fabrication techniques, passivation materials and processing, and silicon crystal orientation may very well have a greater influence on the degradation from ionizing radiation than the emitter periphery.
Keywords
bipolar transistors; radiation effects; base current; degradation; emitter periphery; fabrication techniques; ionizing radiation; passivation materials;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1974.6499150
Filename
6499150
Link To Document