Title :
Domain structure of TbFe magnetostrictive films by MFM
Author :
Shih, Jhy-Chau ; Chin, Tsung-Shune ; Sun, Zhi-gang ; Zhang, Hong-wei ; Shen, Bao-Gen
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
fDate :
7/1/2001 12:00:00 AM
Abstract :
TbFe thin films with giant magnetostriction were deposited by DC magnetron sputtering onto Si(100) substrate at different sputtering parameters, including substrate temperatures (Ts, 20-420°C), sputtering power (35-100 W) and sputtering time (5-30 min). The samples were amorphous as characterized by XRD. Effect of sputtering parameters on domain structure, as explored by magnetic force microscopy (MFM), was focused. The films prepared under different sputtering parameters showed different domain patterns, such as maze or/and spotty (bubble) ones. The easy axis either in-plane or out-of-plane is affected by film-deposition parameters, specifically the film thickness. The wall energy (Lγ) increases with him thickness, leading to looser bubble domains while the magnetic anisotropy constant (Ku) decreases with increasing substrate temperature
Keywords :
X-ray diffraction; iron alloys; magnetic domain walls; magnetic domains; magnetic force microscopy; magnetic thin films; magnetostriction; perpendicular magnetic anisotropy; sputtered coatings; terbium alloys; 20 to 420 C; 35 to 100 W; 5 to 30 min; DC magnetron sputtering; Si; Si(100) substrate; TbFe; TbFe thin film; X-ray diffraction; amorphous phase; bubble domain; domain wall energy; easy axis; magnetic anisotropy constant; magnetic domain structure; magnetic force microscopy; magnetostriction; perpendicular anisotropy; Amorphous magnetic materials; Magnetic anisotropy; Magnetic domains; Magnetic films; Magnetic force microscopy; Magnetostriction; Perpendicular magnetic anisotropy; Sputtering; Substrates; Temperature;
Journal_Title :
Magnetics, IEEE Transactions on
