• DocumentCode
    1533077
  • Title

    Aerosol generation and decomposition of CFC-113 by the ferroelectric plasma reactor

  • Author

    Yamamoto, Toshiaki ; Jang, Ben W L

  • Author_Institution
    Dept. of Energy Syst. Eng., Osaka Prefecture Univ., Japan
  • Volume
    35
  • Issue
    4
  • fYear
    1999
  • Firstpage
    736
  • Lastpage
    742
  • Abstract
    Plasma chemical decomposition, aerosol generation and product distribution of trichlorotrifluoroethylene (CFC-113 [CCl2F-CClF2]) were investigated using a ferroelectric plasma reactor. CFC-113 decomposition was the highest with dry hydrogen, but was not significantly affected by background gases (N 2 and air) and humidity. Most of the aerosols produced under plasma were of a particle size less than 0.1 μm. The aerosol generation rate increased with applied voltage and concentration, but was not affected by humidity and background gases, indicating that aerosol generation is associated with plasma energy per volume (plasma power density). Aerosolization of 1000-ppm CFC-113 was approximately 10 aerosols/cm3 for air, significantly greater than N2. The greatest quantity of reaction gas phase byproducts was for dry H2, followed by dry N2, wet N2 , wet air and dry air. Reaction gas phase byproducts were minimal with aerated condition. The plasma reaction starts out by breaking the C-C bond to form radicals, which react with background gas radicals. The formation of CHClF-CClF2 during CFC-113 decomposition indicates that the C-F bond is much stronger than the C-Cl bond and the C-Cl bond with more P atoms is stronger than that with fewer F atoms
  • Keywords
    decomposition; ferroelectric devices; organic compounds; plasma density; plasma materials processing; C-C bond breaking; CFC-113 decomposition; aerosol generation; ferroelectric plasma reactor; particle size; plasma chemical decomposition; plasma power density; radicals formation; trichlorotrifluoroethylene; Aerosols; Atomic measurements; Bonding; Chemical products; Chemical reactors; Gases; Humidity; Plasma chemistry; Plasma density; Power generation;
  • fLanguage
    English
  • Journal_Title
    Industry Applications, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-9994
  • Type

    jour

  • DOI
    10.1109/28.777179
  • Filename
    777179