DocumentCode
1533077
Title
Aerosol generation and decomposition of CFC-113 by the ferroelectric plasma reactor
Author
Yamamoto, Toshiaki ; Jang, Ben W L
Author_Institution
Dept. of Energy Syst. Eng., Osaka Prefecture Univ., Japan
Volume
35
Issue
4
fYear
1999
Firstpage
736
Lastpage
742
Abstract
Plasma chemical decomposition, aerosol generation and product distribution of trichlorotrifluoroethylene (CFC-113 [CCl2F-CClF2]) were investigated using a ferroelectric plasma reactor. CFC-113 decomposition was the highest with dry hydrogen, but was not significantly affected by background gases (N 2 and air) and humidity. Most of the aerosols produced under plasma were of a particle size less than 0.1 μm. The aerosol generation rate increased with applied voltage and concentration, but was not affected by humidity and background gases, indicating that aerosol generation is associated with plasma energy per volume (plasma power density). Aerosolization of 1000-ppm CFC-113 was approximately 10 aerosols/cm3 for air, significantly greater than N2. The greatest quantity of reaction gas phase byproducts was for dry H2, followed by dry N2, wet N2 , wet air and dry air. Reaction gas phase byproducts were minimal with aerated condition. The plasma reaction starts out by breaking the C-C bond to form radicals, which react with background gas radicals. The formation of CHClF-CClF2 during CFC-113 decomposition indicates that the C-F bond is much stronger than the C-Cl bond and the C-Cl bond with more P atoms is stronger than that with fewer F atoms
Keywords
decomposition; ferroelectric devices; organic compounds; plasma density; plasma materials processing; C-C bond breaking; CFC-113 decomposition; aerosol generation; ferroelectric plasma reactor; particle size; plasma chemical decomposition; plasma power density; radicals formation; trichlorotrifluoroethylene; Aerosols; Atomic measurements; Bonding; Chemical products; Chemical reactors; Gases; Humidity; Plasma chemistry; Plasma density; Power generation;
fLanguage
English
Journal_Title
Industry Applications, IEEE Transactions on
Publisher
ieee
ISSN
0093-9994
Type
jour
DOI
10.1109/28.777179
Filename
777179
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