DocumentCode :
1533321
Title :
Three-dimensional integrated optics using polymers
Author :
Garner, Sean M. ; Lee, Sang-Shin ; Chuyanov, Vadim ; Chen, Antao ; Yacoubian, Araz ; Steier, William H. ; Dalton, Larry R.
Author_Institution :
Dept. of Electr. Eng.-Electrophys., Southern California Edison Co., Los Angeles, CA, USA
Volume :
35
Issue :
8
fYear :
1999
fDate :
8/1/1999 12:00:00 AM
Firstpage :
1146
Lastpage :
1155
Abstract :
Some of the key components are demonstrated to make three-dimensional (3-D) optical integrated circuits possible using polymers. Fabrication techniques of shadow reactive ion etching, shadow photolithography, and gray-level photolithography to produce complex 3-D integrated optic structures are demonstrated. Vertical waveguide bends exhibit excess losses of <0.3 dB, and vertical power splitters possess predictable output splitting ratios between multiple core levels with excess losses of <0.5 dB. Vertical polarization splitters exhibit power extinction ratios of 15 dB between the output core layers. A 1×4 vertical-horizontal power splitter is also demonstrated. Additionally, these techniques are used to integrate different polymer materials into the same optical circuit while easily solving the mode mismatch problem. To show the technique, a polymer electrooptic modulator is vertically integrated with a low-loss waveguide
Keywords :
electro-optical modulation; integrated optoelectronics; optical beam splitters; optical fabrication; optical interconnections; optical losses; optical planar waveguides; optical polymers; photolithography; sputter etching; waveguide discontinuities; 0.3 dB; 0.5 dB; 1×4 vertical-horizontal power splitter; complex 3D integrated optic structures; excess losses; fabrication techniques; gray-level photolithography; low-loss waveguide; mode mismatch problem; multiple core levels; optical circuit; optical integrated circuits; output core layers; output splitting ratios; polymer electrooptic modulator; polymer materials; polymers; power extinction ratios; shadow photolithography; shadow reactive ion etching; three-dimensional integrated optics; vertical integration; vertical polarization splitters; vertical power splitters; vertical waveguide bends; Etching; Integrated optics; Lithography; Optical device fabrication; Optical devices; Optical losses; Optical polymers; Optical waveguides; Particle beam optics; Photonic integrated circuits;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/3.777214
Filename :
777214
Link To Document :
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