DocumentCode :
1533902
Title :
Estimating and controlling atomic chlorine concentration via actinometry
Author :
Hanish, Courtney K. ; Grizzle, Jessy W. ; Teny, F.L.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
Volume :
12
Issue :
3
fYear :
1999
fDate :
8/1/1999 12:00:00 AM
Firstpage :
323
Lastpage :
331
Abstract :
Actinometry has been used as the basis of a successful sensor for controlling fluorine concentration in fluorocarbon plasmas commonly employed in etching. An analogous sensor would be useful for chlorine plasmas as well. One problem with actinometry in Cl2 plasmas is that excitation can occur by electron impact dissociation and by dissociative attachment, leading to potential ambiguity between the intensity of observed chlorine emission in a plasma and the actual concentration of chlorine. On the basis of a simple model, this paper analyzes the consequences of the dissociative excitation pathway on the accuracy of the estimation and control of chlorine concentration via actinometry. When the contribution of the dissociative excitation pathway is known, it is shown that asymptotic observer theory can be used to improve the accuracy of the estimation of chlorine concentration
Keywords :
chemical variables measurement; electron attachment; electron impact dissociation; radiometry; sputter etching; actinometry; asymptotic observer theory; atomic chlorine concentration; dissociative attachment; dissociative excitation pathway; electron impact dissociation; plasma etching; Atomic beams; Atomic measurements; Control systems; Dry etching; Gas lasers; Plasma applications; Plasma materials processing; Plasma measurements; Plasma temperature; Sputter etching;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/66.778197
Filename :
778197
Link To Document :
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