DocumentCode :
1533961
Title :
Building neural network equipment models using model modifier techniques
Author :
Marwah, Manish ; Mahajan, Roop L.
Author_Institution :
Dept. of Mech. Eng., Colorado Univ., Boulder, CO, USA
Volume :
12
Issue :
3
fYear :
1999
fDate :
8/1/1999 12:00:00 AM
Firstpage :
377
Lastpage :
381
Abstract :
In this paper, we address the problem of developing accurate neural network equipment models economically. To this end, we propose model modifier techniques in conjunction with physical-neural network models. Two model modifiers-difference method and source input method-are proposed and evaluated on a horizontal chemical vapor deposition reactor. The results show that the source input method outperforms the difference method. Further, to develop a model of comparable accuracy, the source input method reduces the number of experimental data points to approximately one fourth of those needed without this approach
Keywords :
chemical vapour deposition; digital simulation; neural nets; semiconductor process modelling; difference method; horizontal chemical vapor deposition reactor; model modifier techniques; neural network equipment models; physical-neural network models; source input method; Analytical models; Chemical vapor deposition; Computational modeling; Manufacturing processes; Mechanical engineering; Neural networks; Physics; Predictive models; Semiconductor device manufacture; Virtual manufacturing;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/66.778208
Filename :
778208
Link To Document :
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