DocumentCode :
1534553
Title :
Design, tolerance analysis, and fabrication of silicon oxynitride based planar optical waveguides for communication devices
Author :
Worhoff, Kerstin ; Lambeck, Paul V. ; Driessen, Alfred
Author_Institution :
MESA Res. Inst., Twente Univ., Enschede, Netherlands
Volume :
17
Issue :
8
fYear :
1999
fDate :
8/1/1999 12:00:00 AM
Firstpage :
1401
Lastpage :
1407
Abstract :
Planar optical waveguiding structures for application in communication networks are highly demanding with respect to low insertion loss, efficient fiber-to-chip coupling, polarization independent operation, high integration density, reliable fabrication, and last but not least cost efficiency. When applying silicon oxynitride, which is a very versatile material, planar waveguiding structures can be designed having the potential of meeting all those requirements. In this paper, we will describe the design of such a waveguiding structure, demonstrate the practical feasibility of realizing this structure and discuss the preliminary measurement results
Keywords :
optical communication equipment; optical design techniques; optical fabrication; optical losses; optical planar waveguides; silicon compounds; SiON; communication networks; fiber-to-chip coupling; high integration density; low insertion loss; optical communication devices; planar optical waveguiding structures; planar waveguiding structures; polarization independent operation; reliable fabrication; silicon oxynitride based planar optical waveguide fabrication; tolerance analysis; waveguiding structure; Communication networks; Insertion loss; Integrated optics; Optical device fabrication; Optical fiber communication; Optical fiber losses; Optical fiber networks; Optical fiber polarization; Silicon; Tolerance analysis;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/50.779161
Filename :
779161
Link To Document :
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