DocumentCode :
1534652
Title :
InAlN/GaN HEMTs for Operation in the 1000 ^{\\circ} \\hbox {C} Regime: A First Experiment
Author :
Maier, D. ; Alomari, M. ; Grandjean, N. ; Carlin, J. -F ; Diforte-Poisson, M. -A ; Dua, C. ; Delage, S. ; Kohn, E.
Author_Institution :
Inst. of Electron Devices & Circuits, Univ. of Ulm, Ulm, Germany
Volume :
33
Issue :
7
fYear :
2012
fDate :
7/1/2012 12:00:00 AM
Firstpage :
985
Lastpage :
987
Abstract :
GaN-based heterostructures, and here, particularly, the lattice matched InAlN/GaN configuration, possess high chemical and thermal stability. Concentrating on refractory metal contact schemes, HEMT devices have been fabricated allowing high-temperature 1-MHz large-signal operation at 1000°C (in vacuum) for 25 h. Despite slow gate contact degradation, major degradation of the heterostructure could not be observed. Extrapolation of the RF characteristics suggests that operation up to gigahertz frequencies at this temperature may be feasible.
Keywords :
III-V semiconductors; aluminium compounds; extrapolation; gallium compounds; high electron mobility transistors; high-temperature techniques; indium compounds; thermal stability; wide band gap semiconductors; HEMT devices; InAlN-GaN; RF characteristics extrapolation; chemical stability; frequency 1 MHz; gigahertz frequencies; heterostructure degradation; high-temperature large-signal operation; lattice matched configuration; refractory metal contact schemes; slow gate contact degradation; temperature 1000 degC; thermal stability; time 25 h; Gallium nitride; HEMTs; Logic gates; MODFETs; Temperature; Temperature measurement; Thermal stability; Gallium nitride (GaN) heterostructures; InAlN/GaN HEMT; high-temperature electronics; reliability;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2012.2196972
Filename :
6213492
Link To Document :
بازگشت