Title :
The Dependence of Retention Time on Gate Length in UTBOX FBRAM With Different Source/Drain Junction Engineering
Author :
Nicoletti, Talitha ; Aoulaiche, Marc ; Almeida, Luciano M. ; Santos, Sara D dos ; Martino, João A. ; Veloso, Anabela ; Jurczak, Malgorzata ; Simoen, Eddy ; Claeys, Cor
Author_Institution :
IMEC, Leuven, Belgium
fDate :
7/1/2012 12:00:00 AM
Abstract :
The floating-body-RAM sense margin and retention-time dependence on the gate length is investigated in UTBOX devices using BJT programming combined with a positive back bias (so-called V th feedback). It is shown that the sense margin and the retention time can be kept constant versus the gate length by using a positive back bias. Nevertheless, below a critical L, there is no room for optimization, and the memory performances suddenly drop. The mechanism behind this degradation is attributed to GIDL current amplification by the lateral bipolar transistor with a narrow base. The gate length can be further scaled using underlap junctions.
Keywords :
bipolar transistors; circuit optimisation; random-access storage; BJT programming; GIDL current amplification; UTBOX FBRAM devices; floating-body-RAM sense margin; gate length; gate-induced drain leakage; lateral bipolar transistor; positive back bias; retention time dependence; source-drain junction engineering; Degradation; Junctions; Logic gates; Programming; Random access memory; Silicon; Standards; 1T-floating-body RAM (FBRAM); Retention time; UTBOX; scalability; sense margin; underlap;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2012.2196968