Title :
Compact Low-Voltage Operation Micromirror Based on High-Vacuum Seal Technology Using Metal Can
Author :
Chu, Hoang Manh ; Tokuda, Takayuki ; Kimata, Masafumi ; Hane, Kazuhiro
Author_Institution :
Dept. of Nanomech., Tohoku Univ., Sendai, Japan
Abstract :
In this paper, we present the design, fabrication, and vacuum package of an electrostatic comb-drive resonant micromirror. The micromirror having a high resonant frequency suitable for a laser scanning display was fabricated using a silicon-on-insulator (SOI) wafer. An individual die which was an array of four micromirrors with a total size of 5.5 × 5.5 mm2 was diced from the SOI wafer by dry etching. The die was packaged in a transistor-outline-8 metal can with a window in a vacuum-packaging machine at a pressure of 10-4 Pa. To evacuate the residual gases generated after the package process, a nonevaporable getter was used in the metal can. The resonant frequencies of the fabricated micromirrors were 13 and 25 kHz, respectively. An optical rotation angle of about 10° was achieved at a low driving voltage of 5 V. Due to the decrease of air-friction loss, the operation voltage decreased by a factor of 32 compared with the voltage operated at atmospheric pressure. The operation pressure in the vacuum package was evaluated to be about 0.7 Pa from the amplitude and quality factor of the mirror oscillation. Moreover, several properties, such as the surface profile of the micromirror, were evaluated before and after the packaging. The durability of the packaged mirror was tested at temperatures of up to 75°C. The theoretical explanations about air friction were also described.
Keywords :
etching; micromirrors; optical design techniques; optical scanners; compact low-voltage operation micromirror; dry etching; electrostatic comb-drive resonant micromirror; high-vacuum seal technology; laser scanning display; metal can; silicon-on-insulator wafer; vacuum package; Air friction; TO8 metal can; low-voltage operation micromirror; nonevaporable getter (NEG);
Journal_Title :
Microelectromechanical Systems, Journal of
DOI :
10.1109/JMEMS.2010.2055545