Title :
Hetero-Gate-Dielectric Tunneling Field-Effect Transistors
Author :
Choi, Woo Young ; Lee, Woojun
Author_Institution :
Dept. of Electron. Eng., Sogang Univ., Seoul, South Korea
Abstract :
A tunneling field-effect transistor (TFET) is considered one of the most promising alternatives to a metal-oxide-semiconductor field-effect transistor due to its immunity to short-channel effects. However, TFETs have suffered from low on-current, severe ambipolar behavior, and gradual transition between on- and off -states. To address those issues, the authors have proposed hetero-gate-dielectric TFETs. The proposed device enhances on-current, suppresses ambipolar behavior, and makes abrupt on-off transition by replacing the source-side gate insulator with a high-k material, which induces a local minimum of the conduction band edge at the tunneling junction.
Keywords :
field effect transistors; high-k dielectric thin films; ON-current; ambipolar behavior; conduction band edge; hetero-gate-dielectric tunneling field-effect transistors; high-k material; metal-oxide-semiconductor field-effect transistor; source-side gate insulator; tunneling junction; Conducting materials; FETs; High K dielectric materials; High-K gate dielectrics; Insulation; Leakage current; MOSFETs; Mercury (metals); Silicon; Tunneling; Ambipolar behavior; gate insulator; hetero-gate-dielectric; subthreshold swing (SS); tunneling field-effect transistor (TFET);
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2010.2052167