Title :
A 7-ns/850-mW GaAs 4-kb SRAM with little dependence on temperature
Author :
Makino, Hiroshi ; Matsue, Shuichi ; Noda, Minoru ; Tanino, Noriyuki ; Takano, Satoshi ; Nishitani, Kazuo ; Kayano, Shimpei
Author_Institution :
Mitsubishi Electr. Corp., Itami, Japan
fDate :
10/1/1990 12:00:00 AM
Abstract :
A GaAs 1 K×4-kb SRAM designed using a novel circuit technology is described. To reduce the temperature dependence and the scattering of the access time, it was necessary to increase the signal voltage swing and to reduce the leakage current in access transistors of unselected memory cells. In the 4-kb SRAM, source-follower circuits were adopted to increase the voltage swing, and the storage nodes of unselected memory cells were raised by about 0.6 V to reduce the subthreshold leakage current in the access transistors. The 4-kb SRAM was fabricated using 1.0-μm self-aligned MESFETs with buried p-layers beneath the FET regions. A maximum address access time of 7 ns and a power dissipation of 850 mW were obtained for the galloping test pattern at 75°C. Little change in the address access time was observed between 0 and 75°C
Keywords :
III-V semiconductors; SRAM chips; Schottky gate field effect transistors; field effect integrated circuits; gallium arsenide; 0 to 75 degC; 1 micron; 4 kbit; 7 ns; 850 mW; GaAs; SRAM; access transistors; buried p-layers; leakage current reduction; maximum address access time; power dissipation; self-aligned MESFETs; signal voltage swing; source-follower circuits; subthreshold leakage current; temperature dependence reduction; unselected memory cells; Circuits; FETs; Gallium arsenide; Leakage current; MESFETs; Random access memory; Scattering; Subthreshold current; Temperature dependence; Voltage;
Journal_Title :
Solid-State Circuits, IEEE Journal of