DocumentCode :
1536616
Title :
AlGaN/AlGaN double-heterojunction ultraviolet light-emitting diodes grown by metal organic chemical vapour deposition
Author :
Wong, M.M. ; Denyszyn, J.C. ; Collins, C.J. ; Chowdhury, U. ; Zhu, T.G. ; Kim, K.S. ; Depuis, R.D.
Author_Institution :
Microelectron. Res. Center, Texas Univ., Austin, TX, USA
Volume :
37
Issue :
19
fYear :
2001
fDate :
9/13/2001 12:00:00 AM
Firstpage :
1188
Lastpage :
1190
Abstract :
Light emitting diodes using an AlxGa1-yNiAl yGa1-yN double-heterojunction have been demonstrated with an ultraviolet emission peak at λ=321 nm with a linewidth of 7.7 nm. The devices were grown by metal organic chemical vapour deposition on c-plane sapphire substrates. The active region is composed of a single layer of AlxGa1-xN (x=0.23) and the cladding layers are p-type and n-type AlyGa1-y N (y=0.45). The light output from the diodes was measured through the sapphire substrate in a `p-side down´ configuration. At a current of 35 mA DC, an output power of ~39 nW was measured without any coatings on the device
Keywords :
III-V semiconductors; MOCVD; aluminium compounds; gallium compounds; light emitting diodes; wide band gap semiconductors; 321 nm; 35 mA; 39 nW; Al2O3; AlxGa1-xN; AlGaN; AlGaN/AlGaN double-heterojunction ultraviolet light-emitting diodes; DC current; active region; c-plane sapphire substrates; cladding layers; light output; linewidth; metal organic chemical vapour deposition; output power; side down configuration; ultraviolet emission peak;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20010779
Filename :
953340
Link To Document :
بازگشت