Title :
Highly stable strained layer leaky-mode diode laser arrays
Author :
Shiau, T.H. ; Sun, S. ; Schaus, C.F. ; Zheng, K. ; Hadley, G. Ronald
Author_Institution :
New Mexico Univ., Albuquerque, NM, USA
Abstract :
A simple fabrication process for InGaAs strained quantum well leaky-mode laser arrays is demonstrated. The arrays are ten-element devices grown by two-step metal-organic chemical vapor deposition. The structure consists of a strained quantum well InGaAs graded index-separate confinement active region and a thin (0.12 mu m), transparent GaAs waveguide region. The near-field pattern typical of leaky-mode phase-locked arrays was measured. Fundamental mode oscillation was observed up to 2 A (threshold was as low as 175 mA). The authors observed a 1 mu s pulsed optical output power of 172 mW per facet and a far-field angle (full width at half maximum) of 1.6 times the diffraction limit at 1 A. This is the first reported operation of a strained quantum well leaky-mode laser utilizing a built-in index step.<>
Keywords :
III-V semiconductors; gallium arsenide; gradient index optics; indium compounds; laser modes; optical losses; optical workshop techniques; semiconductor junction lasers; 0.12 micron; 1 mus; 172 mW; 175 mA to 2 A; InGaAs; built-in index step; diffraction limit; fabrication process; far-field angle; graded index-separate confinement active region; leaky-mode phase-locked arrays; mode oscillation; near-field pattern; quantum well; stable strained layer leaky-mode diode laser arrays; strained quantum well; ten-element devices; transparent GaAs waveguide region; two-step metal-organic chemical vapor deposition; Chemical lasers; Diode lasers; Indium gallium arsenide; Laser modes; Optical arrays; Optical device fabrication; Optical waveguides; Phased arrays; Quantum well lasers; Semiconductor laser arrays;
Journal_Title :
Photonics Technology Letters, IEEE