• DocumentCode
    1537549
  • Title

    New SiGe bipolar transistors and p-i-n diodes for power switching

  • Author

    Hirose, F. ; Souda, Y. ; Nakano, K. ; Goya, S. ; Nishimori, T. ; Okumura, S.

  • Author_Institution
    Adv. Technol. Res. Center, Mitsubishi Kasei Corp., Yokohama, Japan
  • Volume
    48
  • Issue
    10
  • fYear
    2001
  • fDate
    10/1/2001 12:00:00 AM
  • Firstpage
    2417
  • Lastpage
    2420
  • Abstract
    We have first fabricated bipolar transistors and p-i-n diodes for power switching by using SiGe. Misfit dislocations with Ge addition in the film allow the reduction of minority carrier lifetime. If the Ge concentration in the SiGe layer is chosen in the range below 10% to avoid excessive misfit dislocations, the breakdown characteristics of the pn-junction at the SiGe/Si heterojunction are not deteriorated. When SiGe is used at the base layer in npn-n+ bipolar transistors, a fast switching time of ~20 ns is possible in the 280 V-20 A class transistors, while the low on-voltage drop of 0.34 V is achieved at a collector current density of 113 A/cm2. Moreover, if SiGe is applied to the p-anode in the thin -p/n-n+ -diodes, the recovery time can be lowered more than 50% compared with Si diodes with the same structure
  • Keywords
    Ge-Si alloys; carrier lifetime; current density; dislocation density; p-i-n diodes; power bipolar transistors; power semiconductor diodes; power semiconductor switches; semiconductor device breakdown; semiconductor materials; 20 A; 20 ns; 280 V; Ge concentration; SiGe bipolar transistors; SiGe p-i-n diodes; SiGe-Si; SiGe/Si heterojunction; breakdown characteristics; collector current density; minority carrier lifetime reduction; misfit dislocation; npn-n+ bipolar transistors; on-voltage drop; pn-junction; power switching; recovery time; switching time; Bipolar transistors; Electric breakdown; Fabrication; Germanium silicon alloys; Heterojunctions; P-i-n diodes; PIN photodiodes; Silicon germanium; Switching circuits; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.954486
  • Filename
    954486