• DocumentCode
    1538503
  • Title

    Experimental analysis of the electrode products emitted by high-current vacuum arcs

  • Author

    Kutzner, Janusz ; Batura, R. ; Stachowiak, Z.

  • Author_Institution
    Inst. of Electr. Power Eng., Poznan Tech. Univ., Poland
  • Volume
    27
  • Issue
    4
  • fYear
    1999
  • fDate
    8/1/1999 12:00:00 AM
  • Firstpage
    888
  • Lastpage
    893
  • Abstract
    The mass distribution of particles produced in the high-current vacuum arc was investigated. The experiments were concentrated on evaluating the spatial mass distribution emitted in the radial as well as in the azimuthal directions calculated from the mass deposition profile on collectors surrounding the arc discharge. The experiments were carried out in a vacuum chamber evacuated to an ambient pressure <10-4 Pa. High-current arcs in the range from 2-7.5 kA were drawn between butt contacts of 31 and 55 mm in diameter (anode and cathode, respectively) both of a copper-chromium alloy (CuCr25). The surface mass deposited along multi-segment collectors was measured by a micro densitometer, and an inductively coupled plasma (ICP) spectrometer. Two angular mass deposit distributions were determined: the azimuthal distribution on the plane parallel to the cathode surface, and the radial distribution as a function of the angle with respect to the cathode plane. Both distributions were anisotropic and the structure of the deposition layer depended on the angle of incidence of the particles onto the substrate, the density of the particle flux and other factors. The mass deposited on the collectors consisted mostly of chromium molecules (approx. 80% of Cr and 20% Cu) for CuCr25 or CuCr40 electrodes
  • Keywords
    electrodes; plasma density; plasma diagnostics; plasma materials processing; plasma pressure; plasma-wall interactions; vacuum arcs; 2 to 7.5 kA; Cu-Cr; CuCr25 electrodes; CuCr40 electrodes; ambient pressure; angular mass deposit distributions; arc discharge; azimuthal direction; azimuthal distribution; butt contacts; cathode plane; cathode surface; copper-chromium alloy; deposition layer; electrode products; high-current arcs; high-current vacuum arcs; inductively coupled plasma spectrometer; mass distribution; micro densitometer; multi-segment collectors; particle flux; particle production; radial direction; radial distribution; spatial mass distribution; surface mass deposition; vacuum chamber; Anodes; Arc discharges; Cathodes; Chromium; Copper alloys; Density measurement; Electrodes; Plasma density; Plasma measurements; Vacuum arcs;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.782255
  • Filename
    782255