DocumentCode
1538503
Title
Experimental analysis of the electrode products emitted by high-current vacuum arcs
Author
Kutzner, Janusz ; Batura, R. ; Stachowiak, Z.
Author_Institution
Inst. of Electr. Power Eng., Poznan Tech. Univ., Poland
Volume
27
Issue
4
fYear
1999
fDate
8/1/1999 12:00:00 AM
Firstpage
888
Lastpage
893
Abstract
The mass distribution of particles produced in the high-current vacuum arc was investigated. The experiments were concentrated on evaluating the spatial mass distribution emitted in the radial as well as in the azimuthal directions calculated from the mass deposition profile on collectors surrounding the arc discharge. The experiments were carried out in a vacuum chamber evacuated to an ambient pressure <10-4 Pa. High-current arcs in the range from 2-7.5 kA were drawn between butt contacts of 31 and 55 mm in diameter (anode and cathode, respectively) both of a copper-chromium alloy (CuCr25). The surface mass deposited along multi-segment collectors was measured by a micro densitometer, and an inductively coupled plasma (ICP) spectrometer. Two angular mass deposit distributions were determined: the azimuthal distribution on the plane parallel to the cathode surface, and the radial distribution as a function of the angle with respect to the cathode plane. Both distributions were anisotropic and the structure of the deposition layer depended on the angle of incidence of the particles onto the substrate, the density of the particle flux and other factors. The mass deposited on the collectors consisted mostly of chromium molecules (approx. 80% of Cr and 20% Cu) for CuCr25 or CuCr40 electrodes
Keywords
electrodes; plasma density; plasma diagnostics; plasma materials processing; plasma pressure; plasma-wall interactions; vacuum arcs; 2 to 7.5 kA; Cu-Cr; CuCr25 electrodes; CuCr40 electrodes; ambient pressure; angular mass deposit distributions; arc discharge; azimuthal direction; azimuthal distribution; butt contacts; cathode plane; cathode surface; copper-chromium alloy; deposition layer; electrode products; high-current arcs; high-current vacuum arcs; inductively coupled plasma spectrometer; mass distribution; micro densitometer; multi-segment collectors; particle flux; particle production; radial direction; radial distribution; spatial mass distribution; surface mass deposition; vacuum chamber; Anodes; Arc discharges; Cathodes; Chromium; Copper alloys; Density measurement; Electrodes; Plasma density; Plasma measurements; Vacuum arcs;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.782255
Filename
782255
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